Call for applications at Hartford Art School: MFA in Photography‏

Left to right: Installation view, Joseloff Gallery; Morgan Ashcom (class of 2013); installation view, Joseloff Gallery; Robin Dahlberg (class of 2015). Two images at left are courtesy of Daniel Reuter (class of 2013); two images at right are courtesy of Chad Champoux Photography.

Hartford Art School
Call for applications: MFA in Photography
Application deadline: January 14, 2015

Hartford Art School
University of Hartford
200 Bloomfield Ave
West Hartford, CT 06117

www.hartfordphotomfa.org

Our international limited residency MFA in Photography is an innovative program designed for both mature individuals with established experience in the field as well as recent graduates who wish to further their own practice. Our program is the only low-residency MFA in the United States focusing solely on photography. We offer the pursuit of an MFA degree without the inconvenience of having to leave your established network and studio behind. Professional credentials and growth as an artist & educator can be achieved while maintaining your current responsibilities and commitments.

Our approach offers a “blended learning model”—we pair research, independent study, and critiques with on-site classroom learning in various locations around the globe. During the two-week intensive summer sessions students will have ample opportunity to interact with faculty and make use of the advanced analogue and digital facilities at the Hartford Art School—including large format Epson printers, Imacon Flextight scanners and a Colex RA-4 Color Processor. The faculty is gathered from the United States and international locations and is augmented by visiting artists, curators, writers and other leading professionals in the field of photography.

The program couples intensive on-campus sessions during the summer with a travel component in the spring and fall. The three summer sessions meet at the University of Hartford for two weeks, during which students and faculty interact inside and outside the classroom. The fall and spring sessions meet at off-site locations (New York City, San Francisco, Berlin, and other sites) for seven to ten days. In the time between classroom sessions, students complete course assignments and maintain regular contact with their Thesis Advisor. The total time to the MFA is 25 months, of which only ten to twelve weeks are spent away from your studio.

More info can be found at www.hartfordphotomfa.org.

Faculty and guest lecturers include:

Alec Soth, Mary Frey, Dr. Jörg Colberg, Thomas Weski, Michael Schäfer, Doug Dubois, Misha Kominek, Alice Rose George, Adam Bartos, Mark Steinmetz, Susan Lipper, Wiebke Loeper, Michael Vahrenwald,
Robert Lyons: Director

Please note: all applicants must already have a recognized baccalaureate degree from an accredited institution. Students who earned their degree outside of the USA will use the World Education Services (WES) to validate their transcripts. In addition international students are required to have completed the TOEFL unless waived by the director of the program.

The Hartford Art School is accredited by (NASAD) —The University of Hartford is accredited by (NEASC).

The priority deadline for application is January 14. Applications will be considered until the class is full, after that date applications are accepted on a rolling basis until the cohort is filled. Admission notifications are made in late March by email.

Program Director: Robert Lyons, rlyons@hartford.edu

Program Manager: Erica Ann Flood, flood@hartford.edu

 Hartford Art School Call for applications: MFA in Photography Application deadline: January 14, 2015